Local surface charge dissipation studied using force spectroscopy method of atomic force microscopy |
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| Authors: | Reynier I. Revilla Yan–Lian Yang Chen Wang |
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| Affiliation: | Key Laboratory of Standardization and Measurement for Nanotechnology, Chinese Academy of Sciences, National Center for Nanoscience and Technology, Beijing, China |
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| Abstract: | We propose herein a method to study local surface charge dissipation in dielectric films using force spectroscopy technique of atomic force microscopy. By using a normalization procedure and considering an analytical expression of the tip‐sample interaction force, we could estimate the characteristic time decay of the dissipation process. This approach is completely independent of the atomic force microscopy tip geometry and considerably reduces the amount of experimental data needed for the calculation compared with other techniques. The feasibility of the method was demonstrated in a freshly cleaved mica surface, in which the local charge dissipation after cleavage followed approximately a first‐order exponential law with the characteristic time decay of approximately 7–8 min at 30% relative humidity (RH) and 2–3.5 min at 48% RH. Copyright © 2015 John Wiley & Sons, Ltd. |
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| Keywords: | surface charge charge dissipation force spectroscopy atomic force microscopy (AFM) |
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