Estimation of the real temperature of samples in IR cell using OH frequency of silica |
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| Authors: | H. Yamazaki H. Shima E. Yoda J. N. Kondo |
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| Affiliation: | 1. Chemical Resources Laboratory, Tokyo Institute of Technology, Yokohama, Japan;2. Science and Technology Research Center, Inc., Mitsubishi Chemical Group, Yokohama, Japan;3. Department of Chemistry and Material Engineering, Ibaraki National College of Technology, Hitachinaka City, Japan |
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| Abstract: | ![]()
The peak top frequency of the stretching vibration of hydroxyl (OH) groups on amorphous silica reversibly changes accompanied by the change of the sample in temperature under the constant concentration. Using this phenomenon, the estimation of the real temperatures of samples in infrared (IR) cell can be achieved. The temperatures measured from outside the cell are first calibrated to real ones. The OH frequency of silica can be correlated to the real temperature of the sample inside the cell via the calibration of the measured and the real temperatures of samples in each IR cell. Copyright © 2014 John Wiley & Sons, Ltd. |
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| Keywords: | IR temperature calibration OH band |
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