中国物理B ›› 2003, Vol. 12 ›› Issue (2): 198-203.doi: 10.1088/1009-1963/12/2/314

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The reliability of measurements on electron energy distribution function in silane rf glow discharges

林揆训, 林璇英, 池凌飞, 余楚迎, 姚若河, 余云鹏   

  1. Department of Physics, Shantou University, Shantou 515063, China
  • 收稿日期:2002-02-07 修回日期:2002-11-04 出版日期:2003-02-16 发布日期:2005-03-16
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant No 19830533) and by the State Key Development Program for Basic Research of China (Grant No G2000028208).

The reliability of measurements on electron energy distribution function in silane rf glow discharges

Lin Kui-Xun (林揆训), Lin Xuan-Ying (林璇英), Chi Ling-Fei (池凌飞), Yu Chu-Ying (余楚迎), Yao Ruo-He (姚若河), Yu Yun-Peng (余云鹏)   

  1. Department of Physics, Shantou University, Shantou 515063, China
  • Received:2002-02-07 Revised:2002-11-04 Online:2003-02-16 Published:2005-03-16
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant No 19830533) and by the State Key Development Program for Basic Research of China (Grant No G2000028208).

摘要: Electron energy distribution function (EEDF) is a key parameter of plasmas, which is directly proportional to the second derivative of the probe I-V characteristics. Because of an amplifying effect of unavoidable noises in the experimental probe I-V curves during the derivation process, the experimental I-V curves should be smoothed before performing the numerical derivation. This paper investigates the effect of adjustable factors used in the smoothing process on the deduced second derivative of the I-V curves, and an optimum group of the adjustable factors is selected to make the rms deviation of the smoothed I-V curves from the measured curves less than 1%. A simple differentiation circuit is designed and used to measure the EEDF parameter straightforwardly. It is the first time, so far as we know, to measure the EEDF parameters simultaneously by means of both numerical and circuit derivative methods under the same discharge conditions and on the same discharge equipment. The deviation between two groups of mean electron energy E and electron density n_e obtained by the above different methods is within about 7%. This apparently improves the reliability of the measurements of the EEDF parameters.

Abstract: Electron energy distribution function (EEDF) is a key parameter of plasmas, which is directly proportional to the second derivative of the probe I-V characteristics. Because of an amplifying effect of unavoidable noises in the experimental probe I-V curves during the derivation process, the experimental I-V curves should be smoothed before performing the numerical derivation. This paper investigates the effect of adjustable factors used in the smoothing process on the deduced second derivative of the I-V curves, and an optimum group of the adjustable factors is selected to make the rms deviation of the smoothed I-V curves from the measured curves less than 1%. A simple differentiation circuit is designed and used to measure the EEDF parameter straightforwardly. It is the first time, so far as we know, to measure the EEDF parameters simultaneously by means of both numerical and circuit derivative methods under the same discharge conditions and on the same discharge equipment. The deviation between two groups of mean electron energy E and electron density ne obtained by the above different methods is within about 7%. This apparently improves the reliability of the measurements of the EEDF parameters.

Key words: Langmuir probe, reliability, numerical derivation, circuit derivation

中图分类号:  (High-frequency and RF discharges)

  • 52.80.Pi
52.80.Hc (Glow; corona) 52.70.Ds (Electric and magnetic measurements) 52.25.-b (Plasma properties)